| Singulus, Timaris Deposition Tool, 2013 |
| Singulus, Rotris Deposition Chamber, 2015 |
| Jeol, Model: JBX-9500FS, Electron Beam Lithography System, 2015 (1 of 3 in the world) |
| Veeco & CVC (AVP Technology), IBE/w Hiden Endpoint, PVD CVC Sputtering System |
| (2) Plasma Therm, Versaline ICP-Etch Base Process Module, 2015 |
| Futek Furnace, Inc., 3T 300mm Magnetic Vacuum Annealing Oven, 2013 |
| Nikon, Model: NSR S204B |
| FEI, Helios NanoLab, Model: 660 Dual Beam System, 2015 |
| Applied Materials, PDC Veritysem 2 CDSEM |
| Applied Materials, Mirra 3400 CMP Polisher |
| CDSEMI, Model: P9000 Cluster, 2015 |
| Rigaku, 9kW X-ray Generator System (XRD), 2015 |
| Bruker DMFASTSCAN2-SYS Dimesion FastScan Scanning Probe Microscope (AFM), 2015 |
| MicroSense, High Field Kerr-Mapper S-300 System, 2013 |
| MircoSense, High Field Polar Kerr System, 2013 |
| MicroSense, EZ9 VSM, 2013 |
| Class One, SST-421-25-200 Trident Spray Solvent Tool |
| CAPRES A/S, CIPTech-M200, 2015 |
| Accretech America, Inc., UF3000EX Automatic Probing System, 2016 |
| Horiba, Uvisel FUV FGAS + MWL32UV, 2015 |
| LAM Research, OnTrack DSS-200 |
| Four Dimensions, Inc., 280SI, Probe Station, (4Point Probe), 2013 |
| CVD, NV6300 Ellipsometer Unit and Table |
| Agilent PNA Network Analyzer Model N5225A - |
| (3) TEK Cascade Temp Chambers |
| Nikon Microscope Model Optiphot 200 |
| Agilent Leak Detector Model VS |
| Agilent Semiconductor Parameter Analyzer Model 4155C |
| Four Dimensions Automatic Four Point Probe Meter Model 280 |
| HP Precision LCR Meter Model 4284A |
| (2) Signatone Probers |
| (2) Nextest Memory Testers Model Magnum 2 EV |
| Nextest Memory Tester Model 2 PV |
| Tektronix Digital Phosphor Oscilloscope Model DPO 4104 |
| Tokyo Seimitsu Wafer Prober Model UF200S |
| Spectroline UV Eprom Wafer Erasing System Model PC-1100A |
| Kaeser Air Compressor Model SM10 |
| Facility Support, Generator, DI Water System, Computers, Office Furniture and Much, Much More!! |
